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Semiconductor manufacturing handbook [electronic resource] / Hwaiyu Geng, editor in chief.

Geng, Hwaiyu. (Added Author). Zhou, Lin. (Added Author). Park, Ilsun. (Added Author). Ravi, K. V. (Added Author). Rathore, Hazara S. (Added Author). Chanda, Kaushik. (Added Author). Ren, L. P. (Added Author). Tu, King N. (Added Author). Coumou, David J. (Added Author). Biltoft, Peter. (Added Author). Howard, Charles. (Added Author). Mack, Chris A. (Added Author). Graf, Michael. (Added Author). Zhang, Peng. (Added Author). Lai, Shouliang. (Added Author). Solzbacher, Florian. (Added Author). McInerney, Edward J. (Added Author). Ramdani, Jamal. (Added Author). Vaccari, Giovanni. (Added Author). Ritzdorf, Tom. (Added Author). Klocke, John. (Added Author). Dyer, Timothy S. (Added Author). Machamer, Andrew. (Added Author). Blair, Donald W. (Added Author). Arai, Kazuhisa. (Added Author). Kobayashi, Yoshikazu. (Added Author). Otani, Hideaki. (Added Author). T�onnies, Dietrich. (Added Author). T�opper, Michael. (Added Author). Wang, Zhong L. (Added Author). Huff, Michael A. (Added Author). Liu, David N. (Added Author). Curcie, Wayne D. (Added Author). Sweeney, Joseph D. (Added Author). Cox, James C. (Added Author). Cavicchi, Kristin. (Added Author). Barsness, Dan. (Added Author). Gould, Charles K. (Added Author). Albrecht, David J. (Added Author). Li, Bo. (Added Author). Carriker, Wayne. (Added Author). Haris, Clint. (Added Author). Peltinov, Ram. (Added Author). Menaker, Mina. (Added Author). Scibilia, Bruno. (Added Author). Altis, Yoan Dupret. (Added Author). McCafferty, Robert H. (Added Author). Davis, Brett J. (Added Author). Trammell, Steven R. (Added Author). Pavlotsky, Richard V. (Added Author). Beck, Stephen C. (Added Author). Gendreau, Michael. (Added Author). Amick, Hal. (Added Author). Levit, Larry. (Added Author). Muller, Chris. (Added Author). Kochevar, Steven. (Added Author). Gromala, Jerry. (Added Author). Pinkowski, Richard E. (Added Author). IDC Corporation. (Added Author).
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Electronic resources

Subject: Semiconductors > Design and construction.
Integrated circuits > Design and construction.
Semiconductors > Materials.
Integrated circuits > Reliability.
Dielectrics.
Silicides.
Plasma engineering.
Process control.
Vacuum techology.
Integrated circuits > Masks.
Microlithography.
Ion implantation.
Rapid thermal process.
Plasma etching.
Etching.
Physical vapor deposition.
Chemical vapor deposition.
Epitaxy.
Electrolytic polishing.
Semiconductors > Polishing.
Semiconductors > Cleaning.
Grinding and polishing.
Microelectronic packaging.
Electronic packaging.
Nanotechnology.
Microfabrication.
Microelectromechanical systems.
Flat panel displays.
Gases.
Waste gases > Purification.
Hydraulic conveying.
Slurry pipelines.
Chemical plants > Waste disposal.
Water-supply engineering.
Materials handling.
Metrology.
Six sigma (Quality control standard)
Semiconductor industry > Environmental aspects.
Semiconductor industry > Health aspects.
Semiconductor industry > Safety measures.
Clean rooms > Design and construction.
Vibration.
Noise control.
Static eliminators.
Electrostatics.
Airborne infection.
Air > Pollution.
Sewage > Purification > Neutralization.
Genre: Electronic books.
Internet resources.

Record details

  • ISBN: 0071468153
  • ISBN: 9780071445597
  • Physical Description: 1 electronic text : ill.
  • Publisher: New York : McGraw-Hill, [2005]

Content descriptions

General Note: Print version c2005.
Bibliography, etc. Note: Includes bibliographical references and index.
Formatted Contents Note: http://www.loc.gov/catdir/enhancements/fy0624/2005045580-t.html
Pt. 1. Semiconductor fundamentals and basic materials -- pt. 2. Wafer processing -- pt. 3. Final manufacturing -- pt. 4. Nanotechnology, EMS, and FPD -- pt. 5. Gases and chemicals -- pt. 6. Fab yield, operations, and facilities.
Additional Physical Form available Note: Also issued in print and PDF version.
Biographical or Historical Data: Contributor biographical information: http://www.loc.gov/catdir/enhancements/fy0624/2005045580-b.html
Source of Description Note: Description based on cover image and table of contents, viewed on May 4, 2007.
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050 4. ‡aTK7871.85 ‡b.S42935 2005
08204. ‡a621.3815/2 ‡222
24500. ‡aSemiconductor manufacturing handbook ‡h[electronic resource] / ‡cHwaiyu Geng, editor in chief.
260 . ‡aNew York : ‡bMcGraw-Hill, ‡c[2005]
300 . ‡a1 electronic text : ‡bill.
4901 . ‡aMcGraw-Hill's AccessEngineering
500 . ‡aPrint version c2005.
504 . ‡aIncludes bibliographical references and index.
5050 . ‡uhttp://www.loc.gov/catdir/enhancements/fy0624/2005045580-t.html
5050 . ‡aPt. 1. Semiconductor fundamentals and basic materials -- pt. 2. Wafer processing -- pt. 3. Final manufacturing -- pt. 4. Nanotechnology, EMS, and FPD -- pt. 5. Gases and chemicals -- pt. 6. Fab yield, operations, and facilities.
530 . ‡aAlso issued in print and PDF version.
5450 . ‡aContributor biographical information: ‡uhttp://www.loc.gov/catdir/enhancements/fy0624/2005045580-b.html
588 . ‡aDescription based on cover image and table of contents, viewed on May 4, 2007.
650 0. ‡aSemiconductors ‡xDesign and construction.
650 0. ‡aIntegrated circuits ‡xDesign and construction.
650 0. ‡aSemiconductors ‡xMaterials.
650 0. ‡aIntegrated circuits ‡xReliability.
650 0. ‡aDielectrics.
650 0. ‡aSilicides.
650 0. ‡aPlasma engineering.
650 0. ‡aProcess control.
650 0. ‡aVacuum techology.
650 0. ‡aIntegrated circuits ‡xMasks.
650 0. ‡aMicrolithography.
650 0. ‡aIon implantation.
650 0. ‡aRapid thermal process.
650 0. ‡aPlasma etching.
650 0. ‡aEtching.
650 0. ‡aPhysical vapor deposition.
650 0. ‡aChemical vapor deposition.
650 0. ‡aEpitaxy.
650 0. ‡aElectrolytic polishing.
650 0. ‡aSemiconductors ‡xPolishing.
650 0. ‡aSemiconductors ‡xCleaning.
650 0. ‡aGrinding and polishing.
650 0. ‡aMicroelectronic packaging.
650 0. ‡aElectronic packaging.
650 0. ‡aNanotechnology.
650 0. ‡aMicrofabrication.
650 0. ‡aMicroelectromechanical systems.
650 0. ‡aFlat panel displays.
650 0. ‡aGases.
650 0. ‡aWaste gases ‡xPurification.
650 0. ‡aHydraulic conveying.
650 0. ‡aSlurry pipelines.
650 0. ‡aChemical plants ‡xWaste disposal.
650 0. ‡aWater-supply engineering.
650 0. ‡aMaterials handling.
650 0. ‡aMetrology.
650 0. ‡aSix sigma (Quality control standard)
650 0. ‡aSemiconductor industry ‡xEnvironmental aspects.
650 0. ‡aSemiconductor industry ‡xHealth aspects.
650 0. ‡aSemiconductor industry ‡xSafety measures.
650 0. ‡aClean rooms ‡xDesign and construction.
650 0. ‡aVibration.
650 0. ‡aNoise control.
650 0. ‡aStatic eliminators.
650 0. ‡aElectrostatics.
650 0. ‡aAirborne infection.
650 0. ‡aAir ‡xPollution.
650 0. ‡aSewage ‡xPurification ‡xNeutralization.
655 0. ‡aElectronic books.
655 0. ‡aInternet resources.
7001 . ‡aGeng, Hwaiyu.
7001 . ‡aZhou, Lin.
7001 . ‡aPark, Ilsun.
7001 . ‡aRavi, K. V.
7001 . ‡aRathore, Hazara S.
7001 . ‡aChanda, Kaushik.
7001 . ‡aRen, L. P.
7001 . ‡aTu, King N.
7001 . ‡aCoumou, David J.
7001 . ‡aBiltoft, Peter.
7001 . ‡aHoward, Charles.
7001 . ‡aMack, Chris A.
7001 . ‡aGraf, Michael.
7001 . ‡aZhang, Peng.
7001 . ‡aLai, Shouliang.
7001 . ‡aSolzbacher, Florian.
7001 . ‡aMcInerney, Edward J.
7001 . ‡aRamdani, Jamal.
7001 . ‡aVaccari, Giovanni.
7001 . ‡aRitzdorf, Tom.
7001 . ‡aKlocke, John.
7001 . ‡aDyer, Timothy S.
7001 . ‡aMachamer, Andrew.
7001 . ‡aBlair, Donald W.
7001 . ‡aArai, Kazuhisa.
7001 . ‡aKobayashi, Yoshikazu.
7001 . ‡aOtani, Hideaki.
7001 . ‡aT�onnies, Dietrich.
7001 . ‡aT�opper, Michael.
7001 . ‡aWang, Zhong L.
7001 . ‡aHuff, Michael A.
7001 . ‡aLiu, David N.
7001 . ‡aCurcie, Wayne D.
7001 . ‡aSweeney, Joseph D.
7001 . ‡aCox, James C.
7001 . ‡aCavicchi, Kristin.
7001 . ‡aBarsness, Dan.
7001 . ‡aGould, Charles K.
7001 . ‡aAlbrecht, David J.
7001 . ‡aLi, Bo.
7001 . ‡aCarriker, Wayne.
7001 . ‡aHaris, Clint.
7001 . ‡aPeltinov, Ram.
7001 . ‡aMenaker, Mina.
7001 . ‡aScibilia, Bruno.
7001 . ‡aAltis, Yoan Dupret.
7001 . ‡aMcCafferty, Robert H.
7001 . ‡aDavis, Brett J.
7001 . ‡aTrammell, Steven R.
7001 . ‡aPavlotsky, Richard V.
7001 . ‡aBeck, Stephen C.
7001 . ‡aGendreau, Michael.
7001 . ‡aAmick, Hal.
7001 . ‡aLevit, Larry.
7001 . ‡aMuller, Chris.
7001 . ‡aKochevar, Steven.
7001 . ‡aGromala, Jerry.
7001 . ‡aPinkowski, Richard E.
7102 . ‡aIDC Corporation.
74002. ‡aHow semiconductor chips are made.
74002. ‡aIC design.
74002. ‡aSilicon substrates for semiconductor manufacturing.
74002. ‡aCopper, low-k dielectrics, and their reliability.
74002. ‡aFundamentals of silicide formation on Si.
74002. ‡aPlasma process control.
74002. ‡aVacuum technology.
74002. ‡aPhotomask.
74002. ‡aMicrolithography.
74002. ‡aIon implantation and rapid thermal processing.
74002. ‡aWet etching.
74002. ‡aPlasma etching.
74002. ‡aPhysical vapor deposition.
74002. ‡aChemical vapor deposition.
74002. ‡aEpitaxy.
74002. ‡aECD fundamentals.
74002. ‡aChemical mechanical polishing.
74002. ‡aWet cleaning.
74002. ‡aInspection, measurement, and test.
74002. ‡aGrinding, stress relief, and dicing.
74002. ‡aPackaging.
74002. ‡aNanotechnology and nanomanufacturing.
74002. ‡aFundamentals of microelectromechanical systems.
74002. ‡aFlat-panel display technology and manufacturing.
74002. ‡aSpecialty gas and CDA systems.
74002. ‡aWaste gas abatement systems.
74002. ‡aPFC abatement.
74002. ‡aChemical and slurry handling systems.
74002. ‡aFluid handling components for high-purity liquid chemicals and slurries.
74002. ‡aFundamentals of ultrapure water.
74002. ‡aYield management.
74002. ‡aAutomated material handling system.
74002. ‡aCD metrology and CD-SEM.
74002. ‡aSix sigma.
74002. ‡aAdvanced process control.
74002. ‡aEnvironmental, health, and safety considerations in semiconductor fabrication facilities.
74002. ‡aPlan, design, and construction of a fab.
74002. ‡aCleanroom design and construction.
74002. ‡aMicro-vibration and noise design.
74002. ‡aESD controls in cleanroom environments.
74002. ‡aAirborne molecular contamination.
74002. ‡aParticle monitoring in semiconductor manufacturing.
74002. ‡aWastewater neutralization systems.
830 0. ‡aMcGraw-Hill's AccessEngineering.
85640. ‡uhttp://proxy.library.upei.ca/login?url=http://accessengineeringlibrary.com/browse/semiconductor-manufacturing-handbook ‡yFull text via AccessEngineering
902 . ‡a20140916acc ‡bAccessEngineering
949 . ‡aTK 7871.85 .S42935 ‡wLC ‡c1 ‡i214064-2001 ‡d12/30/2011 ‡lMAIN ‡mMGH ‡q6 ‡rY ‡sY ‡tWEB ‡u5/4/2007 ‡xENG
997 . ‡a(c)2007 Cassidy Cataloguing Services, Inc.
901 . ‡accn00214064 ‡bSystem Local ‡c1208588 ‡tbiblio
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